Electrical, structural and morphological properties of Ni/n-Si contacts
dc.authorscopusid | 9742545600 | |
dc.authorscopusid | 24801954600 | |
dc.authorscopusid | 23100976500 | |
dc.authorscopusid | 18036952100 | |
dc.authorscopusid | 12042075600 | |
dc.authorwosid | akay, sertan kemal/R-7260-2016 | |
dc.authorwosid | PEKSÖZ, AHMET/AAG-9772-2021 | |
dc.contributor.author | Özer, Merve | |
dc.contributor.author | Akay, S. K. | |
dc.contributor.author | Peksöz, Ahmet | |
dc.contributor.author | Ertürk, Kadir | |
dc.contributor.author | Kaynak, G. | |
dc.date.accessioned | 2022-05-11T14:29:28Z | |
dc.date.available | 2022-05-11T14:29:28Z | |
dc.date.issued | 2009 | |
dc.department | Fakülteler, Fen Edebiyat Fakültesi, Fizik Bölümü | |
dc.description.abstract | This paper presents structural, morphological and electrical properties of Ni/n-Si contacts formed by electro-deposition technique. Ni film is deposited on n-type Si (100) substrate using 2 mol/L Nickel Sulphamate, 0.5 mol/L Boric Acid solutions. The morphological properties are investigated by using energy dispersive X-Ray analysis and scanning electron microscopy imaging to perform local distribution of Ni. Electrical measurements have been done at room temperature to investigate the Schottky barrier height. | |
dc.description.sponsorship | Uludag UniversityUludag University [2005/4] | |
dc.description.sponsorship | This work was supported by Uludag University, Scientific Research Project Unit Grant No. 2005/4. We are also thankful to M. C. HACIISMAILOGLU and M. SAFAK for preparing samples used in this investigation. | |
dc.identifier.endpage | 508 | |
dc.identifier.issn | 1842-6573 | |
dc.identifier.issn | 2065-3824 | |
dc.identifier.issue | 5 | en_US |
dc.identifier.scopus | 2-s2.0-77951992309 | |
dc.identifier.scopusquality | Q4 | |
dc.identifier.startpage | 506 | |
dc.identifier.uri | https://hdl.handle.net/20.500.11776/6991 | |
dc.identifier.volume | 3 | |
dc.identifier.wos | WOS:000268622300025 | |
dc.identifier.wosquality | Q4 | |
dc.indekslendigikaynak | Web of Science | |
dc.indekslendigikaynak | Scopus | |
dc.institutionauthor | Ertürk, Kadir | |
dc.language.iso | en | |
dc.publisher | Natl Inst Optoelectronics | |
dc.relation.ispartof | Optoelectronics and Advanced Materials-Rapid Communications | |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.rights | info:eu-repo/semantics/closedAccess | |
dc.subject | Electro-deposition | |
dc.subject | Schottky barrier height | |
dc.subject | Scanning electron microscopy | |
dc.subject | Morphological properties | |
dc.subject | Hydrogen | |
dc.title | Electrical, structural and morphological properties of Ni/n-Si contacts | |
dc.type | Article |
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