Temperature-dependent optical characteristics of sputtered NiO thin films
dc.authorscopusid | 57193666915 | |
dc.authorscopusid | 57222350312 | |
dc.authorscopusid | 23766993100 | |
dc.authorscopusid | 35580905900 | |
dc.authorscopusid | 7003589218 | |
dc.contributor.author | Terlemezoğlu, Makbule | |
dc.contributor.author | Bayraklı Sürücü, Özge | |
dc.contributor.author | Işık, Mehmet | |
dc.contributor.author | Gasanly, Nizami Mamed | |
dc.contributor.author | Parlak, Mehmet | |
dc.date.accessioned | 2022-05-11T14:03:21Z | |
dc.date.available | 2022-05-11T14:03:21Z | |
dc.date.issued | 2022 | |
dc.department | Fakülteler, Fen Edebiyat Fakültesi, Fizik Bölümü | |
dc.description.abstract | In this work, nickel oxide thin films were deposited by radio frequency magnetron sputtering technique. X-ray diffraction (XRD), scanning electron microscopy and energy-dispersive X-ray analysis methods were applied to reveal the structural and morphological properties of sputtered thin films. The XRD pattern of films confirmed the presence of the cubic phase of nickel oxide with the preferential orientation of (200) direction. The surface morphology of thin films was observed as almost uniform and smooth. Optical aspects of sputtered film were studied by employing the room temperature Raman and temperature-dependent transmittance spectroscopy techniques in the range of 10–300 K. Tauc relation and derivative spectroscopy techniques were applied to obtain the band gap energy of the films. In addition, the relation between the band gap energy and the temperature was investigated in detail considering the Varshni optical model. The absolute zero band gap energy, rate of change of band gap energy, and Debye temperature were obtained as 3.57 eV, ? 2.77 × 10–4 eV/K and 393 K, respectively. © 2021, The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature. | |
dc.identifier.doi | 10.1007/s00339-021-05197-y | |
dc.identifier.issn | 0947-8396 | |
dc.identifier.issue | 1 | en_US |
dc.identifier.scopus | 2-s2.0-85121473588 | |
dc.identifier.scopusquality | Q2 | |
dc.identifier.uri | https://doi.org/10.1007/s00339-021-05197-y | |
dc.identifier.uri | https://hdl.handle.net/20.500.11776/4678 | |
dc.identifier.volume | 128 | |
dc.identifier.wos | WOS:000731379000001 | |
dc.identifier.wosquality | Q2 | |
dc.indekslendigikaynak | Web of Science | |
dc.indekslendigikaynak | Scopus | |
dc.institutionauthor | Terlemezoğlu, Makbule | |
dc.language.iso | en | |
dc.publisher | Springer Science and Business Media Deutschland GmbH | |
dc.relation.ispartof | Applied Physics A: Materials Science and Processing | |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.rights | info:eu-repo/semantics/closedAccess | |
dc.subject | Nickel oxide | |
dc.subject | Optical properties | |
dc.subject | Thin film | |
dc.subject | Transparent conductive oxide | |
dc.subject | Conductive films | |
dc.subject | Energy dispersive X ray analysis | |
dc.subject | Energy gap | |
dc.subject | Magnetron sputtering | |
dc.subject | Morphology | |
dc.subject | Nickel oxide | |
dc.subject | Oxide films | |
dc.subject | Scanning electron microscopy | |
dc.subject | Surface morphology | |
dc.subject | Thin films | |
dc.subject | X ray diffraction | |
dc.subject | X ray diffraction analysis | |
dc.subject | Band gap energy | |
dc.subject | Nickel oxide thin films | |
dc.subject | NiO thin film | |
dc.subject | Optical characteristics | |
dc.subject | Radio-frequency-magnetron sputtering | |
dc.subject | Sputtering techniques | |
dc.subject | Temperature dependent | |
dc.subject | Thin-films | |
dc.subject | Transparent conductive oxides | |
dc.subject | X- ray diffractions | |
dc.subject | Optical properties | |
dc.title | Temperature-dependent optical characteristics of sputtered NiO thin films | |
dc.type | Article |
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