Temperature-dependent optical characteristics of sputtered NiO thin films

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dc.authorscopusid57193666915
dc.authorscopusid57222350312
dc.authorscopusid23766993100
dc.authorscopusid35580905900
dc.authorscopusid7003589218
dc.contributor.authorTerlemezoğlu, Makbule
dc.contributor.authorBayraklı Sürücü, Özge
dc.contributor.authorIşık, Mehmet
dc.contributor.authorGasanly, Nizami Mamed
dc.contributor.authorParlak, Mehmet
dc.date.accessioned2022-05-11T14:03:21Z
dc.date.available2022-05-11T14:03:21Z
dc.date.issued2022
dc.departmentFakülteler, Fen Edebiyat Fakültesi, Fizik Bölümü
dc.description.abstractIn this work, nickel oxide thin films were deposited by radio frequency magnetron sputtering technique. X-ray diffraction (XRD), scanning electron microscopy and energy-dispersive X-ray analysis methods were applied to reveal the structural and morphological properties of sputtered thin films. The XRD pattern of films confirmed the presence of the cubic phase of nickel oxide with the preferential orientation of (200) direction. The surface morphology of thin films was observed as almost uniform and smooth. Optical aspects of sputtered film were studied by employing the room temperature Raman and temperature-dependent transmittance spectroscopy techniques in the range of 10–300 K. Tauc relation and derivative spectroscopy techniques were applied to obtain the band gap energy of the films. In addition, the relation between the band gap energy and the temperature was investigated in detail considering the Varshni optical model. The absolute zero band gap energy, rate of change of band gap energy, and Debye temperature were obtained as 3.57 eV, ? 2.77 × 10–4 eV/K and 393 K, respectively. © 2021, The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature.
dc.identifier.doi10.1007/s00339-021-05197-y
dc.identifier.issn0947-8396
dc.identifier.issue1en_US
dc.identifier.scopus2-s2.0-85121473588
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1007/s00339-021-05197-y
dc.identifier.urihttps://hdl.handle.net/20.500.11776/4678
dc.identifier.volume128
dc.identifier.wosWOS:000731379000001
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthorTerlemezoğlu, Makbule
dc.language.isoen
dc.publisherSpringer Science and Business Media Deutschland GmbH
dc.relation.ispartofApplied Physics A: Materials Science and Processing
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectNickel oxide
dc.subjectOptical properties
dc.subjectThin film
dc.subjectTransparent conductive oxide
dc.subjectConductive films
dc.subjectEnergy dispersive X ray analysis
dc.subjectEnergy gap
dc.subjectMagnetron sputtering
dc.subjectMorphology
dc.subjectNickel oxide
dc.subjectOxide films
dc.subjectScanning electron microscopy
dc.subjectSurface morphology
dc.subjectThin films
dc.subjectX ray diffraction
dc.subjectX ray diffraction analysis
dc.subjectBand gap energy
dc.subjectNickel oxide thin films
dc.subjectNiO thin film
dc.subjectOptical characteristics
dc.subjectRadio-frequency-magnetron sputtering
dc.subjectSputtering techniques
dc.subjectTemperature dependent
dc.subjectThin-films
dc.subjectTransparent conductive oxides
dc.subjectX- ray diffractions
dc.subjectOptical properties
dc.titleTemperature-dependent optical characteristics of sputtered NiO thin films
dc.typeArticle

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