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dc.contributor.authorGüllü, H. H.
dc.contributor.authorBayraklı Sürücü, Özge
dc.contributor.authorTerlemezoğlu, Makbule
dc.contributor.authorYıldız, D. E.
dc.contributor.authorParlak, Mehmet
dc.date.accessioned2022-05-11T14:03:16Z
dc.date.available2022-05-11T14:03:16Z
dc.date.issued2019
dc.identifier.issn0957-4522
dc.identifier.urihttps://doi.org/10.1007/s10854-019-01913-w
dc.identifier.urihttps://hdl.handle.net/20.500.11776/4655
dc.description.abstractIn this study, temperature-dependent current–voltage (I–V), frequency-dependent capacitance–voltage (C–V) and conductance–voltage (G/ ?- V) measurements are carried out for the electrical characterization of a zinc oxide (ZnO) thin film-based diode. The sandwich structure in the form of Ag/ZnO/Si/Al is investigated at temperatures between 220 and 360 K and in the frequency region of 1 kHz–1 MHz. ZnO thin film layer is deposited on a p-Si wafer substrate as a transparent conductive oxide layer by taking into consideration possible electronic applications with intrinsic attractive material properties. At each temperature step, the I–V curves showed about two orders of magnitude rectifying behavior and, according to the Schottky diode relation, the saturation current, zero-bias barrier height and ideality factor were extracted as a function of the temperature. In the case of non-ideal diode characteristics due to the inhomogeneties in the diode as observed from the characteristics of the calculated parameters, effective barrier height values are evaluated. In addition, based on the existence of the interface layer, density of interface states in the band gap region and parasitic resistances were determined by the capacitance measurements. © 2019, Springer Science+Business Media, LLC, part of Springer Nature.en_US
dc.language.isoengen_US
dc.publisherSpringer New York LLCen_US
dc.identifier.doi10.1007/s10854-019-01913-w
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCapacitance measurementen_US
dc.subjectDiodesen_US
dc.subjectEnergy gapen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectInterface statesen_US
dc.subjectSandwich structuresen_US
dc.subjectSchottky barrier diodesen_US
dc.subjectSilicon compoundsen_US
dc.subjectSilicon wafersen_US
dc.subjectSubstratesen_US
dc.subjectThin filmsen_US
dc.subjectZinc oxideen_US
dc.subjectDensity of interface stateen_US
dc.subjectEffective barrier heightsen_US
dc.subjectElectrical characteristicen_US
dc.subjectElectrical characterizationen_US
dc.subjectElectronic applicationen_US
dc.subjectFrequency-dependent capacitanceen_US
dc.subjectParasitic resistancesen_US
dc.subjectTransparent conductive oxidesen_US
dc.subjectCapacitanceen_US
dc.titleInvestigation of electrical characteristics of Ag/ZnO/Si sandwich structureen_US
dc.typearticleen_US
dc.relation.ispartofJournal of Materials Science: Materials in Electronicsen_US
dc.departmentFakülteler, Fen Edebiyat Fakültesi, Fizik Bölümüen_US
dc.identifier.volume30en_US
dc.identifier.issue16en_US
dc.identifier.startpage15371en_US
dc.identifier.endpage15378en_US
dc.institutionauthorTerlemezoğlu, Makbule
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.authorscopusid36766075800
dc.authorscopusid55660608000
dc.authorscopusid57193666915
dc.authorscopusid16023635100
dc.authorscopusid7003589218
dc.identifier.wosWOS:000480558400057en_US
dc.identifier.scopus2-s2.0-85069663419en_US


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