Güllü, H. H.Surucu, O.B.Işık, M.Terlemezoğlu, MakbuleParlak, Mehmet2022-05-112022-05-1120200957-4522https://doi.org/10.1007/s10854-020-03688-xhttps://hdl.handle.net/20.500.11776/4663Structural, optical, and electrical properties ZnTe thin films grown by magnetron sputtering technique were studied by X-ray diffraction, atomic force microscopy, Raman spectroscopy, and electrical conductivity measurements. Structural analyses showed that ZnTe thin films grown on soda–lime glass substrates have a cubic crystalline structure. This crystalline nature of the films was also discussed in terms of Raman active modes. From atomic force microscopy images, the smooth and dense surface profile was observed. The conductivity of the film at room temperature was measured as 2.45 × 10?4 (? cm)?1 and the temperature dependency of conductivity showed Arrhenius behavior. The dark conductivity profile was modeled by thermionic emission mechanism and activation energies were extracted. In addition, the conductivity values indicated an increasing behavior with illumination intensity applied between 20 and 115 mW/cm2. The heterojunction diode was generated by sputtering ZnTe film on n-Si wafer substrate and the rectification behavior was evaluated to determine the main diode parameters. © 2020, Springer Science+Business Media, LLC, part of Springer Nature.en10.1007/s10854-020-03688-xinfo:eu-repo/semantics/closedAccessActivation energyCrystal atomic structureHeterojunctionsII-VI semiconductorsLimeNanocrystalline materialsSemiconductor diodesSilicon compoundsSilicon wafersSubstratesTellurium compoundsThermionic emissionZinc compoundsArrhenius behaviorsCrystalline natureElectrical conductivity measurementsHeterojunction diodesIllumination intensityRaman active modesRectification behaviorTemperature dependenciesThin filmsMaterial and Si-based diode analyses of sputtered ZnTe thin filmsArticle31141139011397Q3WOS:0005440916000422-s2.0-85085651060Q2