Özer, MerveAkay, S. K.Peksöz, AhmetErtürk, KadirKaynak, G.2022-05-112022-05-1120091842-65732065-3824https://hdl.handle.net/20.500.11776/6991This paper presents structural, morphological and electrical properties of Ni/n-Si contacts formed by electro-deposition technique. Ni film is deposited on n-type Si (100) substrate using 2 mol/L Nickel Sulphamate, 0.5 mol/L Boric Acid solutions. The morphological properties are investigated by using energy dispersive X-Ray analysis and scanning electron microscopy imaging to perform local distribution of Ni. Electrical measurements have been done at room temperature to investigate the Schottky barrier height.eninfo:eu-repo/semantics/closedAccessElectro-depositionSchottky barrier heightScanning electron microscopyMorphological propertiesHydrogenArticle35506508Q4WOS:0002686223000252-s2.0-77951992309Q4